nanofabrication

Deep-UV Lithographic realization of aperture arrays as etch masks for 3D Nanostructures in Silicon
D. A. Grishina, E. Yüce, C. A. M. Harteveld, and W. L. Vos

Deterministic and Controllable Photonic Scattering Media via Direct Laser Writing
E. Marakis, R. Uppu, M. L. Meretska, K. Gorter, W. L. Vos, and P. W. H. Pinkse
Adv. Opt. Mater. 8, 2001438: 1-7 (2020)

X-Ray Imaging of Functional Three-Dimensional Nanostructures on Massive Substrates
D. A. Grishina, C. A. M. Harteveld, A. Pacureanu, D. Devashish, A. Lagendijk, P. Cloetens, and W. L. Vos
ACS Nano 13, 13932-13939 (2019)

Method to make a single-step etch mask for 3D monolithic nanostructures
D. A. Grishina, C. A. M. Harteveld, L. A. Woldering, and W. L. Vos
Nanotechnology 26, 505302: 1-10 (2015)

A method to pattern masks in two inclined planes for three-dimensional nano- and microfabrication
W. R. Tjerkstra, L. A. Woldering, J. M. Van den Broek, F. Roozeboom, I. D. Setija, and W. L. Vos
J. Vac. Sci. Technol. B 29, 061604: 1-8 (2011)

Three-dimensional photonic crystals as a cage for light
A. F. Koenderink, P. M. Johnson, J. F. G. Lopez, and W. L. Vos
C. R. Physique 3, 67--77 (2002)