Abstract

The light-scattering properties of porous gallium phosphide, prepared by electrochemical etching, are investigated. We show that the photonic strength of the porous semiconductor can be tuned from weak to extremely strong. This tunability is related to the density and size of the pores, which are controlled by the dopant density of the GaP crystals, and the etching potential. Moreover, electrochemical etching does not introduce any significant optical absorption, which makes porous GaP suitable for many photonic applications.

URL

https://doi.org/10.1063/1.1485316

Authors

J. G. Rivas, A. Lagendijk, R.W. Tjerkstra, D. Vanmaekelbergh, and J. J. Kelly

Year of publication

2002

Date published

06/2002

Journal

Appl. Phys. Lett.

Volume

80

Pages

4498-4500

DOI number

10.1063/1.1485316

Keywords

electrochemical etching, multiple light scattering, photonic strength, porous GaP